The Alcatel 2002 2002A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use, not for corrosive/chemical applications. The Alcatel 2002A vacuum pump has a pumping speed 1.5 CFM with an ultimate pressure of 1X10-4 Torr.
The Alcatel 2004 2004A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use, not for corrosive/chemical applications. The Alcatel 2004 2004A vacuum pump has a pumping speed of 3.2 CFM and an ultimate pressure of 1X10-4 Torr.
The Alcatel 2005 Pascal dual stage rotary vane mechanical vacuum pump has applications for use in general vacuum applications in industrial processes and research laboratories. The specifications for the Alcatel 2005 are as follows:
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Pumping Speed 3.8 cfm
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Ultimate Pressure 1x10-4 Torr
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Inlet-Outlet Ports NW 25 (KF-25)
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Single Phase 115/208 VAC
The Alcatel 2008 2008A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use, not for corrosive/chemical applications. The Alcatel 2008A vacuum pump has a pumping speed 7 CFM and an ultimate pressure of 1X10-4 Torr.
For more information call Pumps International about all of our Vacuum Pumps and Blowers.
Call sales by clicking here to contact us about vacuum pumps. We also rebuild pumps and blowers and buy used ones.
The Alcatel 2010 2010SD Pascal SD dual stage rotary vane
mechanical vacuum pump is specifically used for analytical instrument applications such as mass spectrometers,
GC/MS, LC/MS, electron microscopes, residual gas analyzers, sterilizers, vacuum ovens, lasers and
backing combinations. They address all major requirements of the most sensitive applications. High
performance, low noise levels, easy to use, compact design and they come with a single or three phase
universal motor. Pump is for general purpose non-corrosive applications. The Alcatel 2010 2010SD Pascal
SD pumping speed displacement is 6.8 CFM with an ultimate pressure 1x10-4 Torr.
The Alcatel 2012 2012A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use, not for corrosive/chemical applications. The Alcatel 2012 2012A vacuum pump has a pumping speed of 11 CFM and an ultimate pressure of 1X10-4 Torr.
For more information call Pumps International about all of our Vacuum Pumps and Blowers.
Call sales by clicking here to contact us about vacuum pumps. We also rebuild pumps and blowers and buy used ones.
The Alcatel 2015 2015SD Pascal SD dual stage rotary vane mechanical vacuum pump is specifically used for analytical instrument applications such as mass spectrometers, GC/MS, LC/MS, electron microscopes, residual gas analyzers, sterilizers, vacuum ovens, lasers and backing combinations. They address all major requirements of the most sensitive applications. High performance, low noise levels, easy to use, compact design and they come with a single or three phase universal motor. Pump is for general purpose non-corrosive applications. The Alcatel 2015 2015SD Pascal SD pumping speed displacement is 10.6 CFM with an ultimate pressure 1x10-4 Torr.
The Alcatel 2021 Pascal dual stage rotary vane mechanical
vacuum pump has applications for use in general vacuum applications in industrial processes and research
laboratories.
For more information call Pumps International about all of our Vacuum Pumps and Blowers. Call sales by clicking here to contact us about vacuum pumps. We also rebuild pumps and blowers and buy used ones.
The Alcatel 2030 2030A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. These Alcatel 2030 2030A model rebuilt vacuum pumps are for general purpose use and are designed for corrosive chemical applications. Pumping Speed Displacement for the Alcatel 2030 2030A rebuilt refurbished vacuum pumps is 23 CFM @ 60Hz with and ultimate pressure of 1X10 -4 Torr.
The standard Alcatel 2030 2030A comes with a dual voltage motor:
1-Ph, 100-120 or 200-230 VAC, 50/50 Hz
3-Ph, 200-230 or 440-480 VAC, 50/60 Hz
These Alcatel 2033C dual stage rotary vane vacuum pumps have
been fully rebuilt for use with perfluoropolyester (PFPE) inert fluids (Krytox® or Fomblin® Oils)
to be semiconductor C1 and C2 compatible. C2 Semiconductor Compatible series pumps share the chemical
resistant features of the C1 series but differ in ways that increase their resistance to chloro- and
fluoro-containing gases found in semiconductor processing. The vane in the high-pressure stage is made
from a composite material, which provides high chemical resistance. Inlet and exhaust hardware is stainless
steel. Our rebuilt semiconductor C2 compatible pumps are prepared for inert PFPE fluids, which must
be ordered separately. Pumping Speed Displacement @ 60Hz 27 CFM. Ultimate pressure 1.5X10 -4 Torr.
The Alcatel 2063 2063A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use, not for corrosive/chemical applications. The Alcatel 2063 2063A vacuum pump has a pumping speed of 45 CFM and an ultimate pressure of 1X10-4 Torr.
For more information call Pumps International about all of our Vacuum Pumps and Blowers.
Call sales by clicking here to contact us about vacuum pumps. We also rebuild pumps and blowers and buy used ones.
The Alcatel 2100 2100A dual stage rotary vane mechanical vacuum pump has applications for use with epoxy degassing, sterilization, space research, mass spectrometry, vacuum ovens, lasers and backing combinations. For General Purpose use of heavy industrial applications, not for corrosive/chemical use.